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dc.contributor.authorChachereau, Alise
dc.contributor.authorFedor, Juraj
dc.contributor.authorJanečková, Radmila
dc.contributor.authorKočišek, Jaroslav
dc.contributor.authorRabie, Mohamed
dc.contributor.authorFranck, Christian M.
dc.date.accessioned2016-11-01T07:48:57Z
dc.date.available2016-11-01T07:48:57Z
dc.date.issued2016
dc.identifier.citationJournal of Physics D: Applied Physics. 2016, vol. 49, issue 37, art. no. 375201.cs
dc.identifier.issn0022-3727
dc.identifier.issn1361-6463
dc.identifier.urihttp://hdl.handle.net/10084/112202
dc.description.abstractThe electron attachment properties of octafluorotetrahydrofuran (c-C4F8O) are investigated using two complementary experimental setups. The attachment and ionization cross sections of c-C4F8O are measured using an electron beam experiment. The effective ionization rate coefficient, electron drift velocity and electron diffusion coefficient in c-C4F8O diluted to concentrations lower than 0.6% in the buffer gases N2, CO2 and Ar, are measured using a pulsed Townsend experiment. A kinetic model is proposed, which combines the results of the two experiments.cs
dc.language.isoencs
dc.publisherIOP Publishingcs
dc.relation.ispartofseriesJournal of Physics D: Applied Physicscs
dc.relation.urihttp://dx.doi.org/10.1088/0022-3727/49/37/375201cs
dc.rights© 2016 IOP Publishing Ltdcs
dc.subjectC4F8Ocs
dc.subjectoctafluorotetrahydrofurancs
dc.subjectattachment cross sectioncs
dc.subjectswarm parameterscs
dc.subjectthree-body attachmentcs
dc.titleElectron attachment properties of c-C4F8O in different environmentscs
dc.typearticlecs
dc.identifier.doi10.1088/0022-3727/49/37/375201
dc.type.statusPeer-reviewedcs
dc.description.sourceWeb of Sciencecs
dc.description.volume49cs
dc.description.issue37cs
dc.description.firstpageart. no. 375201cs
dc.identifier.wos000384093000016


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